分支
沟槽金属-氧化物-半导体势垒肖特基整流二极管/ trench metal-oxide-semiconductor barrier Schottky rectifier diode; TMBS /trench metal-oxide-semiconductor barrier Schottky rectifier diode; TMBS
功率半导体器件在平面型二极管的基础上,利用金属-氧化物-半导体(metal-oxide-semiconductor,MOS)效应制备的整流二极管。屏蔽栅金属-氧化物-半导体场效应晶体管/ shielding-gate metal-oxide-semiconductor field effect transistor /shielding-gate metal-oxide-semiconductor field effect transistor
功率半导体器件在20~300伏的垂直硅基功率器件中,为了提高器件开关速度和单位面积电流能力,引入额外的屏蔽栅极的功率器件。简称屏蔽栅场效应晶体管。垂直双扩散金属-氧化物-半导体场效应晶体管/ vertical double diffusion metal-oxide-semiconductor field effect transistor; VDMOSFET /vertical double diffusion metal-oxide-semiconductor field effect transistor; VDMOSFET
功率半导体器件栅极(gate,G)和源极(source,S)都在器件的表面,而漏极(drain,D)在器件的背面,电流纵向流动的场效应晶体管。横向双扩散金属-氧化物-半导体场效应晶体管/ lateral double diffusion metal-oxide-semiconductor field effect transistor; LDMOSFET /lateral double diffusion metal-oxide-semiconductor field effect transistor; LDMOSFET
功率半导体器件利用硼、磷扩散系数不同,工艺上可通过在同一窗口相继进行硼、磷杂质两次扩散形成器件的N+源区和P阱(P-well),且由硼、磷扩散的横向宽度之差精确决定沟道长度的场效应晶体管。超结金属-氧化物-半导体场效应晶体管/ super junction metal-oxide-semiconductor field effect transistor /super junction metal-oxide-semiconductor field effect transistor
功率半导体器件漂移区中交替的N型掺杂柱与P型掺杂柱形成沿着竖直方向的PN结的晶体管。简称SJ-MOSFET。